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Nickel Ultra Fine Powder

Nickel Ultra Fine Powder Supporting the IT and Mobile Revolution

Along with the rapid development of information networks, compact and lightweight electronics components are now playing an increasingly pivotal role in the IT revolution. The development of such advanced, high-performance, and compact products owes much of its success to the use of new functional materials in making electrodes and wiring material. We developed ultra-fine powder nickel in 1995 and have seen tremendous growth of this product for use in internal electrodes of multilayer ceramic capacitors.

Ceramic capacitors are important electronic components that function together with diodes to convert alternating current (AC) into direct current (DC) and to significantly reduce high-frequency signal noise. A typical high-performance smartphone, for example, contains 700 to 800 of these ceramic capacitors.

Nickel ultra fine powder with average grain size of 0.2 μm

Nickel ultra fine powder with average grain size of 0.2 μm

Ultra-fine, high-purity nickel powder with a purity of at least 99.9% is used in manufacturing multilayer ceramic capacitors for smartphones, laptops, and ADAS/collision-avoidance systems and other electronically controlled automotive systems. The use of these ceramic capacitors helps manufacturers make products more compact and lightweight.

Nickel Ultra Fine Powder

Chemical Vapor Deposition (CVD) Manufacturing Method

We are the first company globally to successfully commercialize the industrial production of nickel ultra fine powder by utilizing the chemical vapor deposition (CVD) method. This process produces nickel ultra fine powder by heating and vaporizing nickel chloride, which is then allowed to react with hydrogen.

Chemical Vapor Deposition (CVD) Manufacturing Method

Product Features

1. Spherical shape

2. Average diameter: 0.2-0.4μm

3. Sharp particle size distribution
geometric standard deviation: 1.3-1.5

4. High crystallinity
average crystalline size >0.1μm

5. Stable surface covered by oxidised film

6. Smooth surface

7. High purity Ni >99.9%

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